Handbook of Photomask Manufacturing Technology

Handbook of Photomask Manufacturing Technology

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available.

The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.

Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

Country	USA
Binding	Hardcover
EAN	9780824753740
Edition	1
ISBN	0824753747
IsEligibleForTradeIn	1
Label	CRC Press
Manufacturer	CRC Press
NumberOfItems	1
NumberOfPages	728
PublicationDate	2005-04-07
Publisher	CRC Press
SKU	M0824753747
Studio	CRC Press
ReleaseDate	0000-00-00

Handbook of Photomask Manufacturing Technology

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