Microlithography: Science and Technology, Second Edition (Opitcal Science and Engineering)

• Immersion Lithography
• 157nm Lithography
• Electron Projection Lithography (EPL)
• Extreme Ultraviolet (EUV) Lithography
• Imprint Lithography
• Photoresists for 193nm and Immersion Lithography
• Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.